| 학회 |
한국고분자학회 |
| 학술대회 |
2006년 봄 (04/06 ~ 04/07, 일산킨텍스) |
| 권호 |
31권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Synthesis and Characterization of Nanoporous Ultralow-Dielectric Films by Grafted and Dual- Porogen Methods |
| 초록 |
A new method for obtaining ultralow-k (k＜~2.1) films was developed in order to overcome numerous issues. At high porosities above 20 %, it is difficult to obtain isolated nanopore structure by the conventional porogen blending approach. We employed two kinds of porogens to obtain the interconnection-free nanopore structure induced by their mutual repulsion. One was chemically grafted to the matrix material by copolymerization. The other was incorporated by the blending method. As a result, ultralow-k films showed a bimodal distribution of pore sizes caused by two separate pore generation processes, without interconnection between the two types of pores even at high porosities greater than 30%. |
| 저자 |
심재환1, 노현욱2, 박지혜1, 박은수1, 이희우3, David W. Gidely4, 윤도영5
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| 소속 |
1서울대, 2NIST, 3서강대, 4Department of Physics, 5Univ. of Michigan |
| 키워드 |
Ultralow-Dielectric Films; Grafted and Dual- Porogen Methods
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| E-Mail |
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