| 학회 | 한국고분자학회 |
| 학술대회 | 2005년 가을 (10/13 ~ 10/14, 제주 ICC) |
| 권호 | 30권 2호 |
| 발표분야 | 고분자 구조 및 물성 |
| 제목 | Nanopatterning of block copolymer using nanoimprint lithography |
| 초록 | Diblock copolymer thin films have significant potential for use as templates and scaffolds for the fabrication array of nanometer scale structures over large area. For the fabrication of practical devices at the micro- or nanoscale, block copolymer (BCP) need to be patterned so that desired BCP domains only appear at the place where they are needed. Among approaches for pattering BCPs, graphoepitaxy is a method that can generate miro- or nanopatterns of BCP on a substrate that is patterned using conventional photolithpgraphy or e-beam lithography. Here we report the use of nanoimplint lithography (NIL) for patterning block copolymer. NIL creates features by a mechanical deformation of a polymer film by pressing a hard mold into the film at temperatures higher then the glass transition temperature of the polymer. We used an elastomeric poly(dimethylsiloxane) (PDMS) mold. It is not only easier to demold from the polymer surface than the hard mold but also high-throughput, low cost process. The BCP polymer film used in our experiment is poly(styrene)-b-poly(methyl methacrylate (PS-PMMA) which forms cubic PMMA phase in a PS matrix. In this experiment, PS-PMMA nanopatten could be fabricated as precise positioning of the phase-separated domains via the topology of mold using NIL. |
| 저자 | 정진미, 권기영, 김사라, 양승만, 정희태 |
| 소속 | 한국과학기술원 생명화공과 |
| 키워드 | block copolymer; nanoimprint lithography |
