화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2019년 가을 (10/30 ~ 11/01, 제주국제컨벤션센터(ICC JEJU))
권호 23권 2호
발표분야 포스터_디스플레이
제목 Remote Gating of Schottky Barrier for Transistors and Their Vertical Integration
초록 The remote gating relies on the sensitive work function of graphene, whose local variation induced by locally applied field effect affects the change in the work function of the entire material. Using Kelvin probe force microscopy analysis, we directly visualize how this local variation in the work function propagates through graphene. These properties of graphene are exploited to assemble remote-gated vertical Schottky barrier transistors (v-SBTs) in an unconventional device architecture. Furthermore, a vertical complementary circuit is fabricated by simply stacking two remote-gated v-SBTs (pentacene layer as the p-channel and indium gallium zinc oxide layer as the n-channel) vertically. We consider that the remote gating of graphene and the associated device architecture presented herein facilitate the extendibility of graphene-based v-SBTs in the vertical assembly of logic circuits.
저자 최영진1, 김성찬1, 조정호2
소속 1성균관대, 2연세대
키워드 Schottky barrier transistor; remote gating; graphene; Kelvin probe force microscopy; vertical integration
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