| 학회 | 한국공업화학회 |
| 학술대회 | 2018년 봄 (05/02 ~ 05/04, 대구 엑스코(EXCO)) |
| 권호 | 22권 1호 |
| 발표분야 | 디스플레이_포스터 |
| 제목 | Simple a-IGZO TFT Fabrication using Advanced Imprint Lithography |
| 초록 | The imprint lithography is being researched around the world because it has the advantage of decreased process step. This study aims to fabricate a-IGZO TFT of bottom gate-type using the advanced imprint lithography. Study represents TFT fabrication process using imprint lithography. Before the imprinting, layers were deposited Al, SiNx, a-IGZO and Cr on the substrate. The surface was spin-coated with resin to make 3-D imprinted structure. Imprinting on the coated resin was performed using a pattern transferred mold from a master template with TFT of width/length=100/50μm. Multi-layers were dry etched using the process gas. An a-IGZO TFT fabricated by the above process has threshold voltage(Vth) of 1.3V, linear field effect mobility(μFE) of 3.8cm²/Vs, on/off ratio of ＞106, and subthreshold swing of 0.77V/decade. This TFT fabrication process using advanced imprint lithography is expected to be applicable to roll-to-roll backplane process for rollable OLED display in the future. |
| 저자 | 채희남1, 김성진2, 김형태1, 조성민1 |
| 소속 | 1성균관대, 2삼성 디스플레이 / 성균관대 |
| 키워드 | Roll-to-roll; TFT; Imprint |
