학회 | 한국고분자학회 |
학술대회 | 2003년 봄 (04/11 ~ 04/12, 연세대학교) |
권호 | 28권 1호, p.327 |
발표분야 | 기능성 고분자 |
제목 | The Generation of 2D Metallic and Polymeric Nanopattern by Soft Lithography |
초록 | 최대근,유형균,양승만,조정대*,이응숙* 한국과학기술원 생명화학공학과 한국기계연구원* In this work, we report a fabrication method of the various 2D metallic and polymeric Nanopattern with resolution in the range from several μm to 100 nm via controlled undercutting and microcontact printing (μcp) techniques. Silicon masters for the micromolding were made by the electron beam lithography. Composite PDMS molds composed of a thin, hard layer (30- 40 μm) with vinyl and hydrosilane end-linked polymers (h-PDMS) supported by the soft, flexible PDMS layer (3-5 mm). Dry etching methods using a reactive ion etcher, oxygen plasma etcher, and an ion miller and wet etching methods using strong acid or base were used to etch each substrates for the applications of electronic and optical devices. From this work, it is certificated that the composite PDMS mold and the undercutting technique play an important role in the generation of a clear SAM nanopattern on metal substrate. Acknowledgement This research was supported by a grant(M102KN010001-02K1401-00212) from Center for Nanoscale Mechatronics & Manufacturing of 21st Century Frontier Research Program. |
저자 | 최대근;양승만 |
소속 | 한국과학기술원 생명화학공학과;한국과학기술원 생명화학공학과 |
키워드 | Microcontact Printing; Composite PDMS Mold; Controlled Undercutting; SAM |