화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2019년 봄 (05/01 ~ 05/03, 부산 벡스코(BEXCO))
권호 23권 1호
발표분야 디스플레이_포스터
제목 Defect-Free Copolymer Gate Dielectrics for Gating MoS2 Transistors
초록 The p(V4D4-co-CHMA) copolymer was developed for use as agate dielectric in molybdenum disulfide (MoS2) field-effect transistors (FETs). The p(V4D4-co-CHMA) copolymer was synthesized via the initiated chemical vapor deposition (iCVD)of two types of monomers: V4D4 and CHMA. Four vinyl groups of V4D4 monomers and cyclohexyl groups of CHMA monomers were introduced to enhance the electrical strength of gate dielectrics through the formation of a highly crosslinked network and to reduce the charge trap densities at the MoS2-dielectric interface. The resulting MoS2 FETs with p(V4D4-co-CHMA) gate dielectrics exhibited excellent electrical properties, including an electron mobility of 35.1 cm2/Vs, a subthreshold swing of 0.2 V/dec, and an Ion/off of 2.6×106.
저자 민홍기, 김민제, 최용석, 조정호
소속 연세대
키워드 MoS2; iCVD; Field-effect transistor (FET); p(V4D4-co-CHMA)
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