| 초록 |
Wet chemical etching of Si with the aid of metal catalyst, so-called metal-assisted chemical etching (MaCE), is a simple and useful way to prepare various Si nanostructures, which can have broad applications in various fields such as sensors, electronic devices and energy conversion, etc. The method, however, has been limited to generate nanoscale features only. In this presentation, we explored its applicability for the fabrication of macro- or macro-scale structures, which might be very useful in microfluidics and microelectromechanical systems. Specifically, various combination of metal catalysts, such as Ag, Au, and Ag/Au bilayer, has been studied for the generation of rather big structures, from microns to hundreds of microns. In addition to the type of metal used for the etching, the thickness and morphology of catalyst has been found to be the important parameters for the macroscale etching of Si. Systematic experimental data will be presented and detailed discussion on mechanisms involved will be shown. |
