화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2018년 봄 (04/04 ~ 04/06, 대전컨벤션센터)
권호 43권 1호
발표분야 기능성 고분자
제목 Effect of purge-time of the Atomic Layer Deposition process to the moisture barrier properties of Aluminum oxide thin films.
초록 We reported thin-film encapsulations based on Al2O3/V4D4-CHMA grown by atomic layer deposition (ALD) and initiated chemical vapor deposition (iCVD) alternatively. ALD is well-known with high conformality and precise thickness control for ultrathin film depositing, however time-consuming is a major limit of ALD process. Besides that, moisture barrier ability is the prime determinant of encapsulations’ performance. In this study, we aimed to optimize the purge-time parameter of ALD process for the high barrier performance. The effects of the purge time on growth rate and barrier properties of Al2O3 thin films with varying the purge-time of precursors – trimethylaluminum (TMA) and ozone (O3) were investigated via SEM, AFM, WVTR test.
저자 Thu Nguyen1, 김성희2, 이준영2
소속 1Sungkyunkwan Univ., 2성균관대
키워드 ALD; Aluminium Oxide; Barrier Film
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