| 초록 |
Pattern of gold nanoparticles on silicone wafer was prepared by via nanosphere lithography. First, monolayer of PS beads was obtained by spreading the PS bead solution on the silicone wafer and evaporating the solvent. Then, the PS bead covered silicone wafer was subjected to gas phase deposition of γ-APS in the reduced pressure chamber, followed by rinsing with toluene to remove PS beads. Next, the silicon wafer was immersed in gold nanoparticle solution for depositing nanoparticles on γ-APS coated area. In addition, pattern size was controlled by thermal aging of the PS beads. Finally, the patterns of gold nanoparticle on silicone wafer were characterized by FE-SEM and AFM. |
