화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2016년 봄 (05/02 ~ 05/04, 여수 엑스포 컨벤션)
권호 20권 1호
발표분야 전기화학_포스터
제목 Electrochemical Deposition of Aluminum Thin Film in Ionic Liquid
초록 We investigated an electrolytic and electroless aluminum plating based on both 1-Ethyl-3-methylimidazolium chloride and diglymes. In each medium, we compared the surface morphology and crosssectional structures formed at different electroplating and electroless conditions, which should affect the stability  of Al deposits. In the case of electrolytic Al plating, it was revealed that the combination of Al electroplating condition and post-treatment is essential to get smooth and compact Al layers. In the meanwhile, electroless plating was performed using  diisobutyl aluminum hydride (DIBAH) as reducing agent in the ionic liquid.  The plating film was analyzed by measurements of X-ray diffraction, scanning electron microscopy with energy-dispersive X-ray analysis (SEM-EDX).
저자 이주열, 송영섭
소속 재료(연)
키워드 Aluminum; Thin film; Deposition; Ionic liquid
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