| 초록 |
This is the first report on the fabrication of defect-free 3D-nanostructures fabricated via interference lithography over 100 μm-thick. When the thickness of 3D nanostructures without defects becomes ultrathick, the mechanical properties could be improved with the various promising advantages such as large surface area, complete photonic bandgaps, interconnected networks due to the presence of nanoscale unit cells. Poly(glycidyl methacrylate-co-acryloisobutyl POSS) (PGP), a new POSS-containing epoxy-functionalized photoresist, is highly transparent, photoactive, and mechanically robust, and best suited to the fabrication of the ultrathick 3D-nanostructures. The PGP nanostructure has shown 17% and 10% of enhanced elastic modulus and hardness, respectively, compared to the PGMA. These results prove the potential of the utilization of 3D-nanostructures as an ideal platform for the MEMS and microfluidics, big data storage, energy devices, photovoltaics, sensors and portable devices etc. |
