| 초록 |
Self-assembly of block copolymer is simple and cost-effective method for manufacturing well-ordered structures that can be used as template for secondary inorganic compound. However, block copolymer self-assembly creates only simple and repeated structures that are pre-determined by block copolymer characteristics, such as block composition and molecular weight. In this work, we offer a simple route to create complex metallic patterns by mixing of different block copolymer solutions without pre-patterns of substrate. For the purpose, PS-b-P2VP and PS-b-P4VP were dissolved in good solvent and selective solvent, respectively, and then mixed of predetermined ratio. Thin film prepared by spin-coating of mixed solution, exhibits patterns of mixture of lines and dots through solvent annealing. Using complexation of pyridine group with metal precursors, different types of inorganic materials can be introduced into complex nanostructure via combination of different precursors. |
