| 학회 | 한국고분자학회 |
| 학술대회 | 2004년 가을 (10/08 ~ 10/09, 경북대학교) |
| 권호 | 29권 2호, p.220 |
| 발표분야 | 고분자 구조 및 물성 |
| 제목 | Antireflection coating using symmetric and asymmetric PS-b-PMMA diblock copolymer |
| 초록 | Recently, it has been many researches about antireflection coating which eliminates the light reflection and increases transmittance through substrates like glass. It can be applied to display industries increasing brightness of LCD or other display panel. In this research, we approached good transmittance and reflectance in visible light region using asymmetric PS-b-PMMA diblock copolymer. For good antireflection effect, it should have low refractive indices and proper film thickness for specific light region. To control refractive indices is more difficult than film thickness. Because the lowest refractive indices for dielectrics are of the order of 1.35. So we use diblock copolymers which have different PMMA volume fraction. Removing PMMA, the film has pores which contain air that its refractive index is 1 and then it’ll cause lower refractive index of diblock copolymer thin film. After spin coating block copolymer, the evaporation of solvent, toluene, the thin film has not well-ordered micro phase separation. We got good transmittance after removing PMMA by UV irradiation followed by rinsing with acetic acid. Fig. 1. Transmittance of PS-b-PMMA coated glass |
| 저자 | 주원철, 박민수, 김진곤 |
| 소속 | 포항공과대 |
| 키워드 | block copolymer; antireflection; PS-b-PMMA |
