| 초록 |
Micro-/Nano-patterned structures with various surface topographies are widely used in material science for sensing, display or bio-application. To make the structures, a photolithography using a photomask is commonly used. However, it would not be possible to change the design of photomask in real time. Herein, we reported droplet-based photomasks for on-demand control of patterns. Droplets containing dye molecules were generated in microfluidic devices and they were close-packed in the reservoir. They absorb the ultraviolet (UV) light selectively. Therefore, micro-patterned structures were fabricated after exposing UV light to photoresist through the photomask. The shape, size and arrangement of droplets were easily tuned by adjusting the flow rates of each fluid. We expect that the microfluidic photomask can reduce the cost and time to fabricate various patterns. In addition, the photomask can fabricate inclined structures which have not been achieved by conventional photomasks. |
