| 학회 |
한국화학공학회 |
| 학술대회 |
2008년 봄 (04/23 ~ 04/25, 제주ICC) |
| 권호 |
14권 1호, p.1114 |
| 발표분야 |
재료 |
| 제목 |
Optical Lithography with Printed Metal Mask And a Simple Superhydrophobic Surface |
| 초록 |
An optical patterning technique is presented in which a metal pattern on a mold is transferred onto a photoresist on a substrate and then the resist with the printed metal mask is flood-illuminated. When the metal mask is illuminated, the light passes only through the resist lenses that are formed in the transfer process and the focusing by these lenses results in a significant reduction in the feature size. The radius of curvature of these nanolenses can be decreased by increasing the pressure for the transfer, leading to decreased feature size. The technique is utilized to produce a simply-structured superhydrophobic surface. |
| 저자 |
김태일, 윤현식, 이홍희
|
| 소속 |
서울대 |
| 키워드 |
Optical lithography; nanotransfer printing; nanofabricarion; superhydrophobic surface
|
| E-Mail |
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| 원문파일 |
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