화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2018년 가을 (10/10 ~ 10/12, 경주컨벤션센터)
권호 43권 2호
발표분야 대학원생 구두발표(영어발표, 발표15분)
제목 Fluorine-containing High-χ Block Copolymers for Sub-10 nm Lithographical Application
초록 Next generation microelectronic aims at high performance devices, which significantly requires miniaturized and ultrafine patterns. Recently, block copolymer (BCP) has emerged as an attractive material to overcome the size limit of the conventional lithography, where Flory-Huggins interaction parameter (χ) is the key to control the BCP pattern size. In this study, we designed a fluorine-containing high-χ BCP which was synthesized by transesterification from precursor BCP. High-yield conversion was achieved using a polymeric catalyst, where the polymer dispersity remain unchanged. Evaluated χ was above 0.2 over the entire temperature range which is 7 fold higher than polystyrene-b-poly(methyl methacrylate). Sub-10 nm lamellae morphology was obtained and the smallest half-pitch feature size was 5 nm from 6.3 kg/mol BCP. Thin film was applied to observe a perpendicular structure resulting a sub-10 nm perpendicular lamellae in as-spun film.
저자 조성준, 전승배, 전태석, 류두열
소속 연세대
키워드 block copolymer; high-chi
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