초록 |
Block copolymer (BCP) self-assembly is emerged nano-patterning in bottom-up system in order to substitute top-down approach. In this study, we fabricated unique BCP micelle arrays on line shaped templates induced from polymer film by just spin-coating. Firstly, to produce parallel oriented polymer patterns, thin films of asymmetric polystyrene-block-poly(2-vinlypyridine) (PS-b-P2VP) were coated on polyvinyl alcohol (PVA) layer and solvent-annealed in chloroform vapor. After surface reconstruction of PS-b-P2VP films and oxygen plasma treatment, nano-patterned structure of PVA templates was obtained. Then, polystyrene-block-poly(4-vinlypyridine) (PS-b-P4VP) micelles were spin-coated on PVA templates. Finally, micelles of PS-b-P4VP which located among the PVA patterns were revealed and it is confirmed that structures of PVA were capable of removal by water via AFM and SEM analysis. Furthermore, these alignments were introduced to optical application with inorganic nanoparticles and dyes. |