| 학회 | 한국재료학회 |
| 학술대회 | 2005년 가을 (11/10 ~ 11/11, 한양대학교) |
| 권호 | 11권 2호 |
| 발표분야 | 전자재료 |
| 제목 | 전기도금법으로 합성한 Bi박막의 소둔처리에 따른 미세조직 및 자기저항 |
| 초록 | Semi-metallic bismuth is a fascinating material for spintronic device applications such as magnetic field sensors and spin-injection devices because of its intrinsic high magnetoresistance (MR) feature. Furthermore, Bi has a similar conductivity to the ferromagnetic materials (FM) which is a great advantage of reducing the interfacial scattering of spins in the spin injection devices. Therefore, high efficiency of spin injection and detection is expected in the FM/Bi junction. Bi thin films are usually grown by sputtering or molecular beam epitaxy (MBE) [4]. MBE-based manufacturing has a disadvantage of very low growth rate, even though it yields excellent quality of film. Sputtering is suffered from very fine grain size which is detrimental to MR. Recently, electroplating was newly introduced to fabricate Bi and high MR of 300,000% at 5K was found in electroplated single-crystal Bi. As-plated poly-crystal Bi gradually changes to single crystal structure during post-annealing. It is recognized that annealing is a key process to give high MR. Since then, a lot of interests have been focused on the microstructural change of electroplated Bi film but little work has been reported. In the work, we investigate the change in microstructure and magneto-resistance (MR) of electro-plated Bi thin film during the annealing. Randomly oriented grains of which size was measured to about 2~20m depending on the thickness were found in as-deposited Bi. MR of as-deposited Bi largely depends on the grain size. Careful annealing carried out at only 1.4℃ below the melting temperature of Bi results in not only grain growth but also textured grains well aligned to [003] preferred orientation of Bi. The MR for as-deposited Bi film was measured to be quite low compared to those of annealed. The drastic change in MR after annealing is largely attributed to the significant grain growth as well as to the trigonal-axis oriented microstructures. |
| 저자 | 장준연1, 최봉기2, 김규태1 |
| 소속 | 1Future Technology Research Divisions, 2Korea Institute of Science and Technology |
| 키워드 | 전기도금; 자기저항; 소둔; 비스무쓰 |
