| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO)) |
| 권호 |
40권 2호 |
| 발표분야 |
분자전자 부문위원회 II |
| 제목 |
Preparation and Characterization of Polymerized Zinc Oxide and Silicon Oxide Layers on Polyehthylene Naphtalate Film |
| 초록 |
Plasma polymerizated Zinc oxide (ZnO) and Silicone Oxide (SiOx) was deposited on a polyethylene naphthalate (PEN) film. Diethylzinc and Hexamethyldisiloxane were used as precursor and oxygen and argon gases were used as reaction gas and carrier gas. The deposition rate, surface morphology, water vapor permeation property of the thin films were characterized at different conditions. The deposition rate of ZnO film was decreased as increasing substrate temperature and oxygen flow rate. The water vapor transmission rate of on PEN substrate was 6.95 g/m2/day but that of SiOx/ZnO/PEN system decreased to ＜ 0.01 mg/m2/day |
| 저자 |
김성룡, 이희진, 송예슬, 김정용, 정현옥, 유민지
|
| 소속 |
한국교통대 |
| 키워드 |
Zinc Oxide; Silicon Oxide Layers; Polyehthylene Naphtalate
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| E-Mail |
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