| 초록 |
Lithographical nano structuring has been actively utilized in various fields due to special functionality and better properties than non-patterned structure. In the field of chemical sensors, highly aligned patterns on the sensor have been developed using lithography techniques such as colloid, soft and photo for enhanced molecular sensing properties. In particular, elastomeric material (e.g. PDMS) is commonly used in soft lithography because of various advantages such as simplicity, low cost, durability and convenience. However, the dimensional transformation of the pattern was observed due to absorption of the solvent in the PDMS mold during the fabrication process. Therefore, in this study, we present a novel patterning method for formaldehyde-imprinted polymer using a sol-gel replica without pattern shrinkage. In addition the sensing characteristics for formaldehyde were compared on two MIP films, which prepared from two replication methods (i.e. PDMS and sol-gel replicas). |
