초록 |
In this study, novolac-derived carbon patterns were prepared by proton beam lithography and carbonization. Novolac thin films spin-coated on a substrate were irradiated with proton ions through a pattern mask at fluences ranging from 1 x 1014 to 1 x 1016 ions/cm2. The proton-irradiated films were developed with a conventional developer to obtain well-defined novolac patterns. The fabricated novolac patterns were carbonized at 1000 oC for 1 h under inert atmosphere. The final carbon patterns were characterized in terms of their morphology, crystalline structure, electrical properties, and electric heating performance. |