| 초록 |
Block copolymer(BCP) with an appropriate molecular weight(Mw) to manufacture the range of length that will interact with visible light is an alternative material for the fabrication of photonic-bandgap structures. However due to low chain mobility, it is difficult to achieve micro phase separation of high Mw BCP via thermal annealing. In here, we demonstrated a new way of fabricating large domain size patterns via thermal annealing with low Mw linear BCP. By introducing random mid-block to linear BCP, we adjusted the interfacial tension and increased domain size. To examine the effect of random mid-blocks, we synthesized ARB triblock copolymer and normal BCP with the same PDI. According to Noro’s work, domain spacing increased up to 15% with increasing compositional PDI. However Using ARB triblock copolymer, we successfully increased lamellar domain size over 30% via thermal annealing. It suggests that random mid-block plays an additional role in increasing lamellar domain spacing. |
