| 초록 |
CuSn thin films were deposited by rf magnetron co-sputtering method on Si(100) with Cu and Sn metal targets with various rf powers. CuSn thin films were characterized by a surface profiler (alpha step), X-ray photoelectron spectroscopy (XPS), X-ray induced Auger electron spectroscopy (XAES). The results of alpha step showed that the thickness of CuSn thin films increased as rf power increased. From the survey XPS spectra, the Cu and Sn peaks were observed. Therefore, we could conclude CuSn thin films were successfully deposited on the Si(100) substrate. The deposited CuSn thin films were investigated the change of chemical environment with high resolution Cu 2p, Cu LMM, and Sn 3d XPS spectra. |
