| 초록 |
Unidirectional planar alignment of soft building blocks such as block copolymer and supramolecule has been utilized as nano pattern template due to its numerous merits, such as small feature size and high areal density. Supramolecular dendrimer, one of the soft building blocks, has smaller feature size and fast stabilization time to self-assembly compared than conventional soft building blocks. Therefore, we can create 2~3 nm line pattern if we can utilize the supramolecular dendrimer as a line template. And then, it is important to create a large-area line template. To realize our new concept, we investigate that the influence of the top substrate shear to the alignment of supramolecular dendrimer. Induced shear force between top substrates and dendrimer films makes highly unidirectional alignment of supramolecular dendrimers over large-area. This study will be a promising approach for obtaining the uniform line template, and can be apply to the nano-pattern applications. |
