화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2008년 봄 (04/23 ~ 04/25, 제주ICC)
권호 14권 1호, p.1283
발표분야 재료
제목 Synthesize Photocurable Polycarbosilane as a Photoresist for Direct SiC Ceramic Patterning
초록 Polycarbosilane (PCS) is a well known preceramic polymer as a SiC precursor, which has been used for high temperature structural materials. Because of its excellent resistance to corrosion and thermal shock, PCS finds widespread applications such as aerospace, weapon systems electronic and photo electronic device. Photocurable PCS, which including no-oxidative curing step for high temperature stable SiC are being used as a thin photoresist for ceramic patterning in a wide range of application such as semiconductor processing, optical circuits, microfluidic devices and microelectromechanical systems (MEMS). At this work, a newly photocurable PCS as a SiC precursor was synthesized by functionalization PCS with various kinds of photocurable precursors via hydrosilylation reaction routes. In addition, another kind of photocurable PCS was also synthesized by mixing with the unsaturated curable compound. The photoactivity behaviors of PCS were investigated and the obtained PCS could be cured by UV irradiation in the presence of photoinitiator.
저자 뉘엔치탄, 김동표
소속 충남대
키워드 Photocurable PCS; SiC patterning
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