| 초록 |
Photocurable polydimethylsiloxane(PDMS) can be used as elastomeric element for nanopatterning to prepare stamps and molds which provide attractive low cost alternatives to photolithography. PDMS, which is usually known as "silicone" or "silicone elastomer", has recieved widespread attention as a special family of polymers since its commercial introduction in the 1940's and is by far the most important inorganic backbone polymer. In this study, we focused on a new photocurable PDMS which was synthesized by the reaction of cinnamoylchloride with a commercially available poly(dimethylsiloxane) derivative. The photocurable PDMS has the main advantage of shorter curing time and shows many physical properties that are attractive for soft lithography. The structures and properties of the prepared polymer were characterized by various methods such as FT-IR, FT-NMR(1H, 13C, and 29Si), and photo-DSC. |
