| 초록 |
To fabricate hexagonal and high-density magnetic particle arrays, several litho-graphic techniques have been used including interference lithography, X-ray lithography, and electron beam lithography. They can be applied to optical devices, DNA or protein electrophoresis, and catalysts. Block copolymers provide self-assembled template that can also be used for nanolithography with inexpensive cost and simpler processing. Our research was aimed at fabricating Ni nanodots followed by raising carbon nanotubes on them, which can be applied to FED(Field Emission Display). PS-PMMA diblock copolymer (PS:PMMA=70:30) was spin-coated on Si wafer and annealed at 170℃ in a vacuum oven. After obtaining hexagonally well-ordered films, we fabricated PS template with nanoholes after removing the PMMA domains via UV exposure followed by rinsing in acetic acid. Chromium and nickel were successively evaporated onto the template. After removing PS matrix with metal on top, we obtained hexagonally ordered Ni nanodots. The surface morphology was obtained by AFM(Atomic Force Microscope).
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