| 학회 | 한국재료학회 |
| 학술대회 | 2004년 봄 (05/14 ~ 05/14, 강릉대학교) |
| 권호 | 10권 1호 |
| 발표분야 | 세라믹스 |
| 제목 | RF 마그네트론 스퍼터에 의해 성막된 YSZ 박막의 특성 |
| 초록 | 1. Introduction Zirconia (ZrO2) has been widely investigated for many applications such as refractory, optical coatings, solid electrolyte for fuel cells and gas sensors, etc. The optical application of zirconia suffers from two serious drawbacks: variation of the refractive index with thickness and high optical loss, especially scattering. Generally, the optical losses are structure- and/or impurity-related and act as performance-limiting factors. A composite thin film made from the mixture of two or more pure materials has new properties, which pure materials do not have. This idea is adopted by this work to improve various properties of zirconia thin films for thin film optics. 2. Experimental Yttria stabilized zirconia (YSZ) thin films were deposited on glass and silicon substrates by RF magnetron sputtering. The plasma atmosphere was pure Ar and a mixture of Ar and O2 gases and the sputtering pressure used was 5×10-3torr. To characterized the properties of the films deposited under various conditions, the following measurements were carried out; film structure and morphology by SEM and TEM, refractive index by ellipsometer and optical transmission by spectrophotometer. 3. Results and discussion The TEM patterns show that 8mol% YSZ films have a tetragonal structure independent of O2 concentration while 3mol% YSZ films have a monoclinic structure in 0% O2 concentration and a monoclinic structure with a small trace of tetragonal (111) phase with O2 concentrations above 10%. The SEM micrographs show that under the identical as-deposited condition the film surface is smoother and the size of fine grain-like particles is smaller in the films with higher yttria content than in those with lower content. This result shows that the presence of the yttria dopant inhibits atomic mobility during film growth, producing a finer texture and smoother surface when the yttria concentration is increased. The transmission of the YSZ films was not improved by increasing the O2 concentration, however, the spectra pattern was strongly influenced by the introduction of O2. 4. Conclusions The 3mol% YSZ and 8mol% YSZ thin films were observed to have various crystal structures with different compositions in accordance with the type of the target materials. The size of fine grain-like particles decreased with increasing the O2 concentration in the sputtering gas in the case of 3mol% YSZ, while it increased in the case of 8mol% YSZ. The transmission spectra of 8mol% YSZ films were not strongly influenced by the substrate temperature and Ar pressure, whereas the refractive index of the YSZ films were strongly affected by the sputtering parameters. 5. References 1. R. W. Knoll and E. R. Bardley, Mater. Res. Soc. Symp. Proc. 30, 235 (1984) |
| 저자 | 이유기 |
| 소속 | 위덕대 |
| 키워드 | RF 마그네트론 스퍼터; YSZ 박막 |
