| 학회 |
한국재료학회 |
| 학술대회 |
2011년 가을 (10/27 ~ 10/29, 신라대학교) |
| 권호 |
17권 2호 |
| 발표분야 |
E. Structural Materials and Processing Technology(구조재료 및 공정기술) |
| 제목 |
Fabrication and Property Evaluation of Mo Sputtering Target by Spark Plasma Sintering Process |
| 초록 |
Pure molybdenum compacts having a high density, purity and a fine-grained microstructure were fabricated by the Spark Plasma Sintering process. Also, the optimized sintering condition can be obtained according to control parameters such as temperature, pressure and heating rate. Molybdenum compacts were accomplished with diameters of Φ150 x 6.35mm and the characteristics of the compacts were analyzed by ICP, XRD and FE-SEM. Also, the Mo thin-films fabricated on a glass substrate using sputtering equipment were analyzed by XRD, TEM and SIMS. A relative density of up to 99% and the grain size of below 8㎛ were obtained at sintering temperatures of 1200℃ and a uniaxial pressure of 60MPa. Also, the Mo compacts having uniformity can be fabricated through a redesigned mold and process control. In addition, the specific resistivity of optimized Mo thin-film was 12.1μΩ∙㎝. |
| 저자 |
이승민1, 박현국1, 윤희준1, 양준모2, 우기도3, 오익현1
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| 소속 |
1한국생산기술(연), 2나노종합팹센터, 3전북대 |
| 키워드 |
Mo sputtering target; high purity and density; fine-grained microstructre; SPS
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| E-Mail |
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