초록 |
Dip pen nanolithography (DPN) is based on an atomic force microscope (AFM) technology which can directly generate various patterns on the surface with a range of inks. But, conventional DPN methods are limited by some disadvantages, such as the limited ink volumes, and the low diffusion speed of large molecules because the surface of general DPN probe is mainly consisted of silicon or silicon nitride (Si/SiN). Now, several modifications of tip surface and tips have been reported to overcome these issues. In our study, we present a new and simple method that uses E-beam irradiation to fabricate the polymer-coated DPN probe. By polymer DPN probe, we have generated patterns of fluorescent materials and bio-materials. |