| 초록 |
We have synthesized particles to analyze the organic contaminants present on the wafer in the mass spectrometry method. Particles are highly efficient for UV absorption, and have the property of adsorbing to PAHs contamination which can originated in wafer processes. The technology can be applied to qualitative analysis of organic residual source on wafer and cannot transform the contamination. The PAHs contamination, which was not seen in previous methods, can be analyzed when the particles are used. |
