| 학회 | 한국재료학회 |
| 학술대회 | 2005년 가을 (11/10 ~ 11/11, 한양대학교) |
| 권호 | 11권 2호 |
| 발표분야 | 나노 및 생체재료 |
| 제목 | 나노임프린트 공정에 적합한 솔-젤 플르오르화 하이브리드 재료 |
| 초록 | In this presentation, we will introduce a fluorinated organic-inorganic hybrid material (fluorinated hybrimer) as an imprinting material and simultaneously an imprinting mold for nano-imprinting process. No special chemical treatment of a release layer is needed for the imprinting step, because the fluorinated hybrimer has fluorine molecules in the backbone. This hydrophobic surface of the fluorinated hybrimer was investigated by a modified AFM force-distance curve. A fluorinated hybrimer can produce a crack-free pattern without leaving any trace of solvent by using a non-hydrolytic sol-gel process. The fluorinated hybrimer can be imprinted for the various applicable several hundred nano scale patterns using by PDMS rubber mold. We can get hard nano patterns, which have good mechanical strength in place of polymeric soft nano patterns. The fluorinated hybrimer mold produced from UV nano-imprint lithography (UV-NIL) also can be used as a imprinting mold for the next UV-NIL and soft lithography without requiring use of an anti-sticking layer. Various nanometer scale patterns including sub-100nm patterns could be obtained from the hybrid mold instead of PDMS mold. The hybrid nano-imprinted patterns as well as the fluorinated hybrid mold are useful for the low cost nano-patterning processes because they produce mechanically strong nano-imprinted patterns, and preserve the expensive original master. |
| 저자 | 김우수1, 최대근2, 진정호1, 배병수1 |
| 소속 | 1한국과학기술원 신소재공학과 광학재료연구실, 2한국기계(연) |
| 키워드 | 솔-젤 하이브리드; 나노임프린트 |
