| 학회 |
한국재료학회 |
| 학술대회 |
2010년 봄 (05/13 ~ 05/14, 삼척 팰리스 호텔) |
| 권호 |
16권 1호 |
| 발표분야 |
B. Nanomaterials Technology (나노소재기술) |
| 제목 |
Surface Investigations on Zirconium Oxynitride Thin Films |
| 초록 |
Zirconium oxynitride thin films deposited on the p-type Si(100) substrate using r.f. magnetron sputtering at different nitrogen and argon pressures have been studied. The thickness of zirconium oxynitride thin films was investigated by spectroscopic ellipsometry (SE) and scanning electron microscopy (SEM) and the thicknesses of the films were found to be in the range of 10-50 nm. The optical properties, such as refractive index, extinction coefficient, and band gap of zirconium oxynitride thin films were also studied by SE. The chemical properties of zirconium oxynitride films were analyzed by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) and reveal that zirconium oxynitride thin films are formed at 30 and 40 sccm of N2 flow rate. Atomic force microscopy (AFM) images show the roughness is decreased and relatively constant with increasing nitrogen gas. |
| 저자 |
박주연, 조준모, 강용철
|
| 소속 |
부경대 |
| 키워드 |
zirconium; oxynitride; film; r.f. sputtering; XPS
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| E-Mail |
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