| 학회 |
한국공업화학회 |
| 학술대회 |
2011년 봄 (05/11 ~ 05/13, 제주국제컨벤션센터) |
| 권호 |
15권 1호 |
| 발표분야 |
고분자 |
| 제목 |
Preparation of Acid-Cleavable Branched Polymers: Control in Size of Primary Chains, Degree of Branching, and Composition Distribution |
| 초록 |
We prepared photoresist polymers for ArF and EUV lithography. The polymers are composed of three (meth)acrylate monomers and an acid-cleavable dimethacrylate and prepared via reversible addition-fragmentation chain transfer (RAFT) polymerization. By controlling the molar feed ratio of monomers to chain transfer agent (CTA) and dimethacrylate to CTA, the molecular weight of primary chains and the degree of branching could be controlled. The polymers can be degraded into short linear polymer under acidic condition. The effects from these factors on the lithographic performance were tested. |
| 저자 |
손해성1, 김동균1, 이애리1, 이재우2, 김정식2, 김재현2, 이종찬1
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| 소속 |
1서울대, 2동진쎄미켐 |
| 키워드 |
Photoresist; living radical polymerization; acid-cleavable branched polymer
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| E-Mail |
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