| 초록 |
The direct carbonisation of polymer materials has been widely demonstrated to produce carbon materials. Specifically, the carbonisation of photoresist polymer patterns allows the lithography-based design of carbon materials, one of the well-established and highly delicate microfabrication techniques. Here, we demonstrate a novel strategy of direct carbonisation of polymer patterns with retaining the structure integrity. We fabricate 3D porous epoxy-functional photoresist nanopatterns using multi-beam interference lithography techniques and successfully convert them to carbon nanopatterns while maintaining their porous features. The carbonisation reaction of SU8 nanopatterns are characterized by FT-IR. The micro-crystallinity of the SU8-derived carbon nanopatterns during the carbonisation are also characterized by Raman spectroscopy. We also demonstrate the application of micropatterned carbons to supercapacitor electrodes. |
