| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터) |
| 권호 |
36권 2호 |
| 발표분야 |
Polymer Directed Assembly |
| 제목 |
Graphene Film as Neutral Layer of PS-b-PMMA for Block Copolymer Lithography |
| 초록 |
We demonstrate a surface energy modification method exploiting graphene film. Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene. |
| 저자 |
김주영1, 김봉훈1, 정성준2, 황진옥1, 김상욱1
|
| 소속 |
1KAIST, 2U.C. Berkley |
| 키워드 |
graphene; block copolymer; ps-b-pmma
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| E-Mail |
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