| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터) |
| 권호 |
36권 2호 |
| 발표분야 |
Polymer Directed Assembly |
| 제목 |
Ultralarge-area block copolymer lithography using self-assembly assisted photoresist pre-pattern |
| 초록 |
We achieved truly scalable, low cost, arbitrarily large-area block copolymer lithography, integrating the two principles of epitaxial self-assembly and graphoepitaxy. Graphoepitaxy morphology composed of highly aligned lamellar block copolymer film that self-assembled within a disposable photoresist trench pattern was prepared by conventional I-line lithography and used as a chemical nanopatterning mask for the underlying substrate. After the residual polymer and photoresist layer were washed, the same lamellar block copolymer film was epitaxially assembled on the exposed chemically patterned substrate. Highly oriented lamellar morphology was accomplished without any trace over an arbitrarily large area. |
| 저자 |
진형민, 김상욱
|
| 소속 |
KAIST |
| 키워드 |
block copolymer; soft graphoepitaxy
|
| E-Mail |
|
