| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터) |
| 권호 |
36권 2호 |
| 발표분야 |
Polymer Directed Assembly |
| 제목 |
Directed assembly of block copolymers on chemically patterned substrates prepared by conventional ArF lithography |
| 초록 |
We present block copolymer multiple patterning as an efficient and truly scalable nanolithography for sub-20 nm scale patterning, synergistically integrated with conventional ArF lithography. The directed assembly of block copolymers on chemically patterned substrates prepared by ArF lithography generated linear vertical cylinder arrays with a 20 to 30 nm diameter, enhancing the pattern density of the underlying chemical patterns by a factor of two or three. This self-assembled resolution enhancement technique affords a straightforward route to highly ordered sub-20 nm scale features via conventional lithography. |
| 저자 |
최영주1, 박승학2, 신동옥1, 김봉훈1, 김상욱1
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| 소속 |
1KAIST, 2삼성전자 |
| 키워드 |
block copolymer; lithography; multiple patterning
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| E-Mail |
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