| 학회 |
한국고분자학회 |
| 학술대회 |
2018년 가을 (10/10 ~ 10/12, 경주컨벤션센터) |
| 권호 |
43권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Fabrication of silica nanostructures with antireflective properties by using SSQZ / block copolymer self-assembly |
| 초록 |
Silica nanostructures find a variety of applications including modern thin-film applications. Among the various approaches, the sol-gel method is the simplest way to control silica nanostructures. However, in our work, SSQZ was used as a replacement silica precursor instead of using a sol-gel process. Since SSQZ has an amine group in the silica-based chain, it has an advantage that it is easy to bond with organic materials when compared with silsesquioxane having a si-o-si structure. In this study, the structure of ssqz was controlled by self-assembly of various block copolymers such as polystyrene-block-poly(ethylene oxide) and polystyrene-block-poly(2-vinylpyridine). The controlled structures exhibit significant antireflective properties for high performance in optoelectronic devices. The silica nanostructures were observed through AFM and SEM, and UV-vis spectrometer was used to measure antireflective properties. |
| 저자 |
최수빈1, 안득주1, 윤광한1, 허태환2, 곽영제2, 김승현1
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| 소속 |
1인하대, 2숭실대 |
| 키워드 |
silsesquiazane(SSQZ); block copolymer; anti-reflection
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| E-Mail |
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