| 학회 |
한국고분자학회 |
| 학술대회 |
2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO)) |
| 권호 |
40권 2호 |
| 발표분야 |
Korea-Taiwan Joint Symposium: Macromolecular Assembly and Nanostructured Polymers (영어발표) |
| 제목 |
Introducing Top Coats for Orientation Control of Self-assembled Structures in Block Copolymer Films and their Use for Patterning Graphene |
| 초록 |
Sub-10 nm high-aspect-ratio patterns from block copolymer (BCP) self-assembly requires both a high interaction parameter and a perpendicular orientation of microdomains. However, these conditions are difficult to achieve simultaneously because the blocks in a high-χ copolymer typically have very different surface energies, favoring in-plane microdomain orientations. We realize a fully perpendicular orientation of a high-χ BCP, PS-b-PDMS, using polyvinyl acetate top coat with a solvent annealing process, despite the large surface energy differences between PS and PDMS. We also use the top coats as a dewetting-induced shearing material for the laterally aligned BCP patterns. Secondly, we fabricated sub-10-nm graphene nano-ribbon arrays and their field effect transistors from the cylindrical PS-b-PDMS line patterns as a lithographical template on CVD-grown graphene monolayer. We also briefly introduce graphene nanomesh structures for improving thermoelectric properties. |
| 저자 |
손정곤 |
| 소속 |
한국과학기술(연) |
| 키워드 |
block copolymer; self-assembly
|
| E-Mail |
|
