화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2009년 가을 (10/08 ~ 10/09, 광주과학기술원 오룡관)
권호 34권 2호
발표분야 고분자 구조 및 물성
제목 Nanoscale Patterning from Functional Block Copolymer Thin Films
초록 We demonstrate a simple route for the preparation of nano-sized arrays of silicon oxide and metallic line from functional block copolymers (BCPs) containing poly(2-vinylpyridine) or PMMA or PDMS block. The P2VP-b-PMMA BCP thin films were exposed to solvent vapors to generate cylindrical microdomains parallel to the substrate. BCP templates were prepared using a surface reconstruction or by removal of PMMA block, depending on the properties of functional BCPs. And then, metallic line patterns were fabricated by electrochemical etching or direct metal deposition using the BCP templates. A P2VP-b-PDMS BCP thin film in xylene or IPA solution, which is selective solvent for P2VP or PDMS was spin-coated on silicon substrate to make spherical micelle. Silicon oxide ring, silicon oxide dot, and Au dot surrounding silicon oxide ring were fabricated from spin-coated spherical micelle using properties of functional group such as P2VP or PDMS.
저자 박수진
소속 울산과학기술대
키워드 Block copolymers; nanoscale patterning
E-Mail