학회 | 한국고분자학회 |
학술대회 | 2002년 봄 (04/12 ~ 04/13, 서울대학교) |
권호 | 27권 1호, p.261 |
발표분야 | 기능성 고분자 |
제목 | UV Stabilization and Abrasion-resistance of Sol-Gel Coatings with high molecular weight UVA and HALS |
초록 | Most transparent polymer materials are susceptible to degradation initiated by heat or UV light during processing or long-term use and mechanical loads easily damage its abrasive surface. Almost UV-protective coating films have been prepared by simple adding of UV absorber (UVA) into the sol-gel network, which results in the blooming of UVA and lowers mechanical properties of films because of its low molecular weight (MW). To improve UV-stabilization and abrasion-resistance of polymer, especially polycarbonate (PC), First, a modified benzophenone (MBP) with high MW was synthesized by controlled isocyanation of (3-isocyanatopropyl)triethoxysilane (IPTES) and 2,2,4,4-tetrahydrobenzophenone (THBP) and MBP into sol-gel network by hydrolysis and condensation reaction. Second, to improve UV absorption of UVA we introduced hindered amine light stabilizers (HALS) as radical scavenger. And also, in order to inhibit blooming HALS we introduced the similar procedure described above UVA’s case. 2,2,6,6-tetramethyl-4-piperidinol and 7,7,9,9-tetramethyl-1,4-dioxa-8-azaspiro (4,5) decane-2-methanol were used as HALS. Silica-gel coating films were prepared by methyltriethoxysilane (MTES), colloidal silica and UV stabilizers. The combination of two different UV stabilizers with high molecular weight improved UV stabilization of UVA with excellent abrasion resistance of surface. |
저자 | 김범호1, 정윤석2, 서판석*3, 이만성**, 조남주 |
소속 | 1부산대, 2*동성화학, 3**동의공업대 |
키워드 | |