| 초록 |
Polymer patterns have been mainly fabricated using lithographic methods such as photolithography, soft lithography, capillary force lithography, and lithographically controlled wetting. These techniques are well-established and reliable, but do not allow the patterning of multiple polymers which can greatly diversify the uses of patterned microstructures. So far, we do not have a strategy to generate multi-component polymer patterns in a simple and inexpensive way. In this study, we utilized buckling to fabricate patterned 2D microstructures comprising multiple polymers. The buckled substrates were used as templates to confine multiple polymers in the trenches of the sinusoidal topology. Unconventional patterns were obtained by taking advantage of localized dewetting of the polymers and they could be transferred to other substrates. We will demonstrate applications of the process of deposition and transfer for strain-controlled release system and stretchable electrodes. |
