| 학회 |
한국화학공학회 |
| 학술대회 |
2022년 봄 (04/20 ~ 04/23, 제주국제컨벤션센터) |
| 권호 |
28권 1호, p.1075 |
| 발표분야 |
[주제 12] 화학공학일반(부문위원회 발표) |
| 제목 |
Selective Deposition of Copper on Self-Assembled Block Copolymer Surfaces via Physical Vapor Deposition |
| 초록 |
Block copolymer (BCP) self-assembly produces chemically and topographically patterned surfaces which are used to guide the formation of Cu nanostructures by exploiting differences in the mobility of vapor-deposited species on each microdomain. Cu metal films a few nm thick were deposited on three different BCP surfaces self-assembled from poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP). For PS-b-PMMA the effects of chemical heterogeneity dominate over the effects of the 2 nm peak-to-valley topography, and sputtered Cu preferentially wets the PS block. PS-b-P2VP has greater chemical and topographical contrast and shows a wider process window for selective deposition. Cu grown by evaporation has less surface mobility and shadowing effects are believed to dominate pattern formation. The hierarchical self-assembly process of thin metal films on BCP surfaces provides a route to fabricating heterogeneous metallic nanostructures. |
| 저자 |
이원무, 정희태
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| 소속 |
한국과학기술원 |
| 키워드 |
고분자(Polymer) |
| E-Mail |
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| 원문파일 |
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