| 초록 |
Roll-to-Roll UV nanoimprint lithography (R2R-UV-NIL) is one of the promising techniques for various electronic applications due to its low cost, simple process, and great precision. For the realization of 100 nm pitch R2R-UV- NIL, a novel fluorinated siloxane-based resin as a soft replica mold was designed and synthesized. To obtain a highly durable material for replica mold, a UV curable resin was synthesized using sol-gel based combinatorial method. The obtained fluorinated siloxane resin possess a variety of properties for R2R-UV-NIL, such as suitable viscosity, low surface energy, good uniformity, and duplication. UV curable resins were formulated by using this siloxane -based acrylate to precisely control the patternability, resin viscosity, and R2R-UV-NIL processability. Replica mold with 100 nm pitch by R2R-UV-NIL process was fabricated using this formulation. |
