화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2017년 봄 (05/10 ~ 05/12, 광주 김대중컨벤센센터(Kimdaejung Convention Center))
권호 21권 1호
발표분야 디스플레이
제목 Synthesis and characterization of high refractive index resins based on acrylate containing Sulfur-atom
초록 The high refractive index are the most mainly important factors for optical application, such as lenses, optical cables, anti-refractive (AR) coating, etc. The general approach to increase the refractive indices of polymers is the introduction of sulfur atoms, which have a high atomic refraction with high atomic refraction with a low molar volume and high molar refraction according to the Lorentz-Lorenz equation. Recently, photo-curing resins based acrylates have been developed for advanced optical application. UV-curing process is one of the most importance techniques owing to low environmental, low consumption of energy and low demand on equipment. Resins based acrylate have various outstanding properties such as rapid curing time, excellent optical properties, and rapid curing time via photo-induced radical polymerization. In this study, we synthesized an resins based on 4,4’-thiobisbenzenethiol containing high sulfur atom through UV-curing process.
저자 석웅철, 임종태, 권세진, 강주희, 송호준, 이상국
소속 한국생산기술(연)
키워드 UV-curable; acryl polymer; high refractive index
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