| 초록 |
Self-assembled block copolymer(BCP) thin films have been extensively studied for applications involving the generation of functional nanostructures. Moreover, excellent pattern resolution, cost-effectiveness, and scalability of directed self-assembly(DSA) based on BCPs is a practical method for optical lithography. Si-containing BCPs such as poly(styrene-block-dimethylsiloxane)(PS-b-PDMS) can provide sub-20 nm resolution with long-range ordering and etch resistance. However, the difficulty in achieving perpendicularly oriented microdomains due to the large difference of surface energy between the two blocks limits aspect-ratio(AR) for the subsequent pattern transfer process. We introduce a way to enhance the AR of the self-assembled patterns obtained from cylinder-forming PS-b-PDMS BCPs by forming thick PS brush layers beneath the BCP thin films, successfully achieving ARs of 1.4–2.1. This study suggests a facile self-assembly methodology to obtain practical nanopatterns. |
