| 학회 | 한국공업화학회 |
| 학술대회 | 2013년 봄 (05/01 ~ 05/03, ICC JEJU) |
| 권호 | 17권 1호 |
| 발표분야 | 포스터-고분자 |
| 제목 | A new photo-alignment material with photogenic moieties for 3D FPR |
| 초록 | A noble photo-alignment material with two functional photosensitive moieties was synthesized in order to show the high photosensitivity at low exposure energy for 3D film patterned retarder. The synthesized polymer films were fabricated to a cell and irradiated with linearly polarized UV(LPUV) light. The pertile angle, the polar anchoring energy and the polar diagram will be discussed about the cell fabricated by the new polymers. |
| 저자 | 최현정, 채종민, 황정연, 서동학 |
| 소속 | 한양대 |
| 키워드 | Photo-alignment; photosensitivity; conjugated polymer; photo-curing; 3D FPR |
