| 초록 |
Sub-10 nm patterns from block copolymers (BCPs) self-assembly can be applied to electrical devices and semi-conductor chip industry. Among BCPs, polystyrene-b-polydimethylsiloxane (PS-b-PDMS) can be used due to high Flory-Huggins parameter which enables formation of sub-10 nm pattern period in a large-area. However, PS-b-PDMS hardly presents perpendicular orientation because of huge difference of surface tension between PS and PDMS blocks, so that PDMS domain with low surface tension locates at the surface. We introduce top coats of polyvinyl acetate (PVAc) on PS-b-PDMS film to form the perpendicular orientation of BCP microdomains and induce dewetting process for the laterally aligned BCP patterns during the solvent annealing. |
