| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 가을 (10/07 ~ 10/08, 대구 EXCO) |
| 권호 |
35권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Water vapor barrier properties of ZnO coating deposited on PEN film by PECVD |
| 초록 |
The water vapor barrier properties of ZnO coating deposited over polyethylene naphthalate(PEN) film by plasma enhanced chemical vapor deposition (PECVD) were studied. To deposit ZnO and SiOx coating, the radio frequency (RF) powers of 100 and 300 W were applied in reactive etching mode and the difference flow rates of O2. The ZnO coating on PEN film was deposited in two ways. Water vapor transmission rates (WVTRs) of single ZnO coating and SiOx/ZnO/SiOx structure were investigated. The minimum WVTR of 0.05 g/m2/day was observed when ZnO coating was applied as a middle layer between SiOx layers. |
| 저자 |
송준용1, 김주호1, 박태재1, 윤수영2, 유충근2, 김성룡1
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| 소속 |
1충주대, 2LG Display Co. |
| 키워드 |
ZnO; PECVD; WVTR
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| E-Mail |
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